Preliminary investigation of an additive approach to the fabrication of precision aspheres

Conference · Fri May 24 00:00:00 EDT 1996

OSTI ID:383074

Weber, F W; Montcalm, C; Vernon, S P; Kania, D R

We report progress in the aspherization of precision optical substrates via deposition of graded period Mo/Si multilayer coatings using a masking technique. These preliminary results show good agreement between the measured and desired thickness profiles over 85% of the sample, however, thickness deviations of up to 7 % are observed in the central area. The errors are attributed to misalignments of the mask relative to the substrate during deposition.

• Research Organization: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 383074
• Report Number(s): UCRL-JC-123008; CONF-9604150-2; ON: DE96014127; CRN: C/LLNL--TC-503-93C
• Resource Relation: Conference: Optical Society of America meeting on extreme ultraviolet lithography, Boston, MA (United States), 29 Apr - 3 May 1996; Other Information: PBD: 24 May 1996
• Country of Publication: United States
• Language: English

Related Subjects

32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES
COATINGS
DEPOSITION
THIN FILMS
SUBSTRATES
MASKING
FABRICATION
THICKNESS
ERRORS
ALIGNMENT
POSITIONING
MOLYBDENUM
SILICON
OPTICAL SYSTEMS
IMAGE PROCESSING