A 3-D numerical study of pinhole diffraction to predict the accuracy of EUV point diffraction interferometry
Conference
·
OSTI ID:378219
- Lawrence Berkeley National Lab., CA (United States)
- California Univ., Berkeley, CA (United States). Dept. of Electrical Engineering and Computer Sciences
A 3-D electromagnetic field simulation is used to model the propagation of extreme ultraviolet (EUV), 13-nm, light through sub-1500 {Angstrom} dia pinholes in a highly absorptive medium. Deviations of the diffracted wavefront phase from an ideal sphere are studied within 0.1 numerical aperture, to predict the accuracy of EUV point diffraction interferometersused in at-wavelength testing of nearly diffraction-limited EUV optical systems. Aberration magnitudes are studied for various 3-D pinhole models, including cylindrical and conical pinhole bores.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 378219
- Report Number(s):
- LBL-38157; CONF-960493-15; ON: DE96013723
- Resource Relation:
- Conference: Optical Society of America (OSA) meeting on integrated photonics research, Boston, MA (United States), 29 Apr - 3 May 1996; Other Information: PBD: Dec 1995
- Country of Publication:
- United States
- Language:
- English
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