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Title: Deposition and surface treatment with intense pulsed ion beams

Abstract

Intense pulsed ion beams (500 keV, 30 kA, 0.5 {mu}s) are being investigated for materials processing. Demonstrated and potential applications include film deposition, glazing and joining, alloying and mixing, cleaning and polishing, corrosion improvement, polymer surface treatments, and nanophase powder synthesis. Initial experiments at Los Alamos have emphasized thin-film formation by depositing beam ablated target material on substrates. We have deposited films with complex stoichiometry such as YBa{sub 2}Cu{sub 3}O{sub 7-x}, and formed diamond-like-carbon films. Instantaneous deposition rates of 1 mm/sec have been achieved because of the short ion range (typically 1{mu}m), excellent target coupling, and the inherently high energy of these beams. Currently the beams are produced in single shot uncomplicated diodes with good electrical efficiency. High-voltage modulator technology and diodes capable of repetitive firing, needed for commercial application, are being developed.

Authors:
; ; ;  [1]; ;  [2]
  1. Los Alamos National Lab., NM (United States)
  2. Sandia National Labs., Albuquerque, NM (United States)
Publication Date:
Research Org.:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
32523
Report Number(s):
LA-UR-95-570; CONF-950201-7
ON: DE95007885; TRN: 95:003033
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Conference
Resource Relation:
Conference: Annual meeting and exhibition of the Minerals, Metals and Materials Society (TMS), Las Vegas, NV (United States), 12-16 Feb 1995; Other Information: PBD: 8 Feb 1995
Country of Publication:
United States
Language:
English
Subject:
66 PHYSICS; HIGH-TC SUPERCONDUCTORS; ENERGY BEAM DEPOSITION; YTTRIUM OXIDES; BARIUM OXIDES; COPPER OXIDES; BEAM-PLASMA SYSTEMS; PERFORMANCE TESTING; TECHNOLOGY ASSESSMENT; CARBON; SURFACE TREATMENTS; ION BEAMS; ENERGY BEAM DEPOSITION FILMS; SURFACE COATING

Citation Formats

Olson, J C, Davis, H A, Rej, D J, Waganaar, W J, Stinnett, R W, and McIntyre, D C. Deposition and surface treatment with intense pulsed ion beams. United States: N. p., 1995. Web.
Olson, J C, Davis, H A, Rej, D J, Waganaar, W J, Stinnett, R W, & McIntyre, D C. Deposition and surface treatment with intense pulsed ion beams. United States.
Olson, J C, Davis, H A, Rej, D J, Waganaar, W J, Stinnett, R W, and McIntyre, D C. 1995. "Deposition and surface treatment with intense pulsed ion beams". United States. https://www.osti.gov/servlets/purl/32523.
@article{osti_32523,
title = {Deposition and surface treatment with intense pulsed ion beams},
author = {Olson, J C and Davis, H A and Rej, D J and Waganaar, W J and Stinnett, R W and McIntyre, D C},
abstractNote = {Intense pulsed ion beams (500 keV, 30 kA, 0.5 {mu}s) are being investigated for materials processing. Demonstrated and potential applications include film deposition, glazing and joining, alloying and mixing, cleaning and polishing, corrosion improvement, polymer surface treatments, and nanophase powder synthesis. Initial experiments at Los Alamos have emphasized thin-film formation by depositing beam ablated target material on substrates. We have deposited films with complex stoichiometry such as YBa{sub 2}Cu{sub 3}O{sub 7-x}, and formed diamond-like-carbon films. Instantaneous deposition rates of 1 mm/sec have been achieved because of the short ion range (typically 1{mu}m), excellent target coupling, and the inherently high energy of these beams. Currently the beams are produced in single shot uncomplicated diodes with good electrical efficiency. High-voltage modulator technology and diodes capable of repetitive firing, needed for commercial application, are being developed.},
doi = {},
url = {https://www.osti.gov/biblio/32523}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Wed Feb 08 00:00:00 EST 1995},
month = {Wed Feb 08 00:00:00 EST 1995}
}

Conference:
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