Grain orientation mapping of passivated aluminum interconnect lines with X-ray micro-diffraction
- Lawrence Berkeley National Lab., CA (United States). Advanced Light Source Div.
- Lawrence Berkeley National Lab., CA (United States)
A micro x-ray diffraction facility is under development at the Advanced Light Source. Spot sizes are typically about 1-{micro}m size generated by means of grazing incidence Kirkpatrick-Baez focusing mirrors. Photon energy is either white of energy range 6--14 keV or monochromatic generated from a pair of channel cut crystals. Laue diffraction pattern from a single grain in a passivated 2-{micro}m wide bamboo structured Aluminum interconnect line has been recorded. Acquisition times are of the order of seconds. The Laue pattern has allowed the determination of the crystallographic orientation of individual grains along the line length. The experimental and analysis procedure used is described, as is the latest grain orientation result. The impact of x-ray micro-diffraction and its possible future direction are discussed in the context of other developments in the area of electromigration, and other technological problems.
- Research Organization:
- Lawrence Berkeley National Lab., Advanced Light Source Div., Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Office of Energy Research, Washington, DC (United States)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 291048
- Report Number(s):
- LBNL-41018; LSBL-458; CONF-980364-; ON: DE98058298; TRN: 99:002153
- Resource Relation:
- Conference: 1998 international conference on characterization and metrology for ULSI technology, Gaithersburg, MD (United States), 23-27 Mar 1998; Other Information: PBD: [1998]
- Country of Publication:
- United States
- Language:
- English
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