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Title: Solid phase epitaxial regrowth of (100)GaAs

Abstract

This thesis showed that low temperature (250°C) SPE of stoichiometrically balanced ion implanted GaAs layers can yield good epitaxial recovery for doses near the amorphization threshold. For 250°C anneals, most of the regrowth occurred in the first 10 min. HRTEM revealed much lower stacking fault density in the co-implanted sample than in the As-only and Ga-only samples with comparable doses. After low temp annealing, the nonstoichiometric samples had a large number of residual defects. For higher dose implants, very high temperatures (700°C) were needed to remove residual defects for all samples. The stoichiometrically balanced layer did not regrow better than the Ga-only and As-only samples. The co-implanted sample exhibited a thinner amorphous layer and a room temperature (RT) annealing effect. The amorphous layer regrew about 5 nm, suggesting that stoichiometrically balanced amorphous layers can regrow even at RT. Mechanisms for solid phase crystallization in (100)GasAs is discussed: nucleation and growth of randomly oriented crystallites and SPE. These two mechanisms compete in compound semiconductors at much lower temperatures than in Si. For the low dose As-only and Ga-only samples with low-temp anneals, both mechanisms are active. For this amorphization threshold dose, crystallites remain in the amorphous layer for all as-implants. 250°Cmore » annealing showed recrystallization from the surface and bulk for these samples; for the co-implant, the mechanism is not evident.« less

Authors:
 [1]
  1. California Univ., Berkeley, CA (United States). Dept. of Materials Science and Mineral Engineering
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE; American Association of Univ. Women
OSTI Identifier:
210931
Report Number(s):
LBL-38437
ON: DE96008481
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Thesis/Dissertation
Resource Relation:
Other Information: TH: Thesis (M.S.); PBD: Feb 1996
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; GALLIUM ARSENIDES; EPITAXY; ION IMPLANTATION; AMORPHOUS STATE; ANNEALING; DAMAGE; RECRYSTALLIZATION; GALLIUM IONS; ARSENIC IONS; ION CHANNELING; TRANSMISSION ELECTRON MICROSCOPY

Citation Formats

Almonte, Marlene Isabel. Solid phase epitaxial regrowth of (100)GaAs. United States: N. p., 1996. Web. doi:10.2172/210931.
Almonte, Marlene Isabel. Solid phase epitaxial regrowth of (100)GaAs. United States. https://doi.org/10.2172/210931
Almonte, Marlene Isabel. 1996. "Solid phase epitaxial regrowth of (100)GaAs". United States. https://doi.org/10.2172/210931. https://www.osti.gov/servlets/purl/210931.
@article{osti_210931,
title = {Solid phase epitaxial regrowth of (100)GaAs},
author = {Almonte, Marlene Isabel},
abstractNote = {This thesis showed that low temperature (250°C) SPE of stoichiometrically balanced ion implanted GaAs layers can yield good epitaxial recovery for doses near the amorphization threshold. For 250°C anneals, most of the regrowth occurred in the first 10 min. HRTEM revealed much lower stacking fault density in the co-implanted sample than in the As-only and Ga-only samples with comparable doses. After low temp annealing, the nonstoichiometric samples had a large number of residual defects. For higher dose implants, very high temperatures (700°C) were needed to remove residual defects for all samples. The stoichiometrically balanced layer did not regrow better than the Ga-only and As-only samples. The co-implanted sample exhibited a thinner amorphous layer and a room temperature (RT) annealing effect. The amorphous layer regrew about 5 nm, suggesting that stoichiometrically balanced amorphous layers can regrow even at RT. Mechanisms for solid phase crystallization in (100)GasAs is discussed: nucleation and growth of randomly oriented crystallites and SPE. These two mechanisms compete in compound semiconductors at much lower temperatures than in Si. For the low dose As-only and Ga-only samples with low-temp anneals, both mechanisms are active. For this amorphization threshold dose, crystallites remain in the amorphous layer for all as-implants. 250°C annealing showed recrystallization from the surface and bulk for these samples; for the co-implant, the mechanism is not evident.},
doi = {10.2172/210931},
url = {https://www.osti.gov/biblio/210931}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Feb 01 00:00:00 EST 1996},
month = {Thu Feb 01 00:00:00 EST 1996}
}

Thesis/Dissertation:
Other availability
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