The chemistry of boron and titanium diboride formation: Decomposition of TiCl{sub 4} and BCl{sub 3} in hydrogen and helium
Measurements of the decomposition of mixtures of boron trichloride (BCl{sub 3}), titanium tetrachloride (TiCl{sub 4}), and hydrogen at elevated temperatures are presented. The decomposition of BCl{sub 3} with hydrogen appears to drive the chemistry in this system. The species depositing boron on the surface contains at least 2 chlorine atoms. Once deposited, the surface chlorine is removed by reaction with hydrogen to form HCl and, presumably, surface B-H bonds.
- Research Organization:
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States); Department of Defense, Washington, DC (United States)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 168691
- Report Number(s):
- SAND-96-8449; ON: DE96003930
- Resource Relation:
- Other Information: PBD: Dec 1995
- Country of Publication:
- United States
- Language:
- English
Similar Records
The chemistry of boron and titanium diboride formation: Decomposition of TiCl{sub 4} and BCl{sub 3} in hydrogen and helium
A class of single-source precursors to titanium disulfide films. Synthesis, structure, and chemical vapor deposition studies of [TiCl[sub 4](HSR)[sub 2]]
Coating of metals with titanium diboride by chemical vapor deposition
Book
·
Tue Dec 31 00:00:00 EST 1996
·
OSTI ID:168691
A class of single-source precursors to titanium disulfide films. Synthesis, structure, and chemical vapor deposition studies of [TiCl[sub 4](HSR)[sub 2]]
Journal Article
·
Wed Sep 01 00:00:00 EDT 1993
· Inorganic Chemistry; (United States)
·
OSTI ID:168691
+1 more
Coating of metals with titanium diboride by chemical vapor deposition
Conference
·
Sat Jan 01 00:00:00 EST 1977
·
OSTI ID:168691