Design and Performance of Capping Layers for EUV Multilayer Mirrors
Conference
·
OSTI ID:15005065
The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of uttermost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in designing the protective capping layer coatings, understanding their performance and estimating their lifetimes based on accelerated electron beam and EUV exposure studies. Our current capping layer coatings have about 40 times longer lifetimes than Si-capped multilayer optics. Nevertheless, the lifetime of current Ru-capped multilayers is too short to satisfy commercial tool requirements and further improvements are essential.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 15005065
- Report Number(s):
- UCRL-JC-152459; TRN: US200414%%570
- Resource Relation:
- Conference: 28th Annual International Symposium on Microlithography, Santa Clara, CA (US), 02/23/2003--02/27/2003; Other Information: PBD: 10 Mar 2003
- Country of Publication:
- United States
- Language:
- English
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