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Title: CO2-Laser Polishing for Reduction of 351-nm Surface Damage Initiation in Fused Silica

Conference ·
OSTI ID:15004628

We have applied a carbon dioxide (CO{sub 2}) raster scanning laser polishing technique on two types of fused silica flat optics to determine the efficacy of CO{sub 2}-laser polishing as a method to increase the 351-nm laser damage resistance of optic surfaces. R-on-1 damage test results show that the fluence for any given 355-nm damage probability is 10-15 J/cm{sup 2} higher (at 3 ns pulse length, scaled) for the CO{sub 2}-laser polished samples. Poor quality and good quality surfaces respond to the treatment such that their surface damage resistance is brought to approximately the same level. Surface stress and the resultant effect on wavefront quality remain key technology issues that would need to be addressed for a robust deployment.

Research Organization:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Organization:
US Department of Energy (US)
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
15004628
Report Number(s):
UCRL-JC-144293; TRN: US0304908
Resource Relation:
Conference: XXXIII Annual Symposium on Optical Materials for High Power Lasers, Boulder, CO (US), 10/01/2001--10/03/2001; Other Information: PDF-FILE: 10 ; SIZE: 0.6 MBYTES; PBD: 1 Nov 2001
Country of Publication:
United States
Language:
English