Top Level User Specifications for Mask Inspection Microscope
This document compiles top-level user specifications for an EUV microscope for characterizing EUVL mask defects. Two broad categories of application are considered: (1) emulation of the imaging characteristics of a stepper for printability analysis (AIM mode); and (2) high-resolution imaging for obtaining a more detailed characterization of defects or mask features. It is generally assumed that the mask defects that are to be characterized have been located by a previous inspection procedure and the spatial coordinates of the defect can be transferred to the microscope.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 15003402
- Report Number(s):
- UCRL-CR-148215; TRN: US200431%%80
- Resource Relation:
- Other Information: PBD: 31 Jan 2002
- Country of Publication:
- United States
- Language:
- English
Similar Records
Actinic Mask Inspection at the ALS Initial Design Review
Actinic EUV mask inspection beyond 0.25 NA
Design and Evaluation of System Configurations for an EUV Mask Inspection Microscope
Technical Report
·
Wed Mar 05 00:00:00 EST 2003
·
OSTI ID:15003402
+14 more
Actinic EUV mask inspection beyond 0.25 NA
Conference
·
Wed Aug 06 00:00:00 EDT 2008
·
OSTI ID:15003402
+4 more
Design and Evaluation of System Configurations for an EUV Mask Inspection Microscope
Thesis/Dissertation
·
Tue Aug 20 00:00:00 EDT 2002
·
OSTI ID:15003402
+1 more