Vendor Capability for Low Thermal Expansion Mask Substrates for EUV Lithography
Development of manufacturing infrastructure is required to ensure a commercial source of mask substrates for the timely introduction of EUVL. Improvements to the low thermal expansion materials that compose the substrate have been made, but need to be scaled to production quantities. We have been evaluating three challenging substrate characteristics to determine the state of the infrastructure for the finishing of substrates. First, surface roughness is on track and little risk is associated with achieving the roughness requirement as an independent specification. Second, with new flatness-measuring equipment just coming on line, the vendors are poised for improvement toward the SEMI P37 flatness specification. Third, significant acceleration is needed in the reduction of defect levels on substrates. The lack of high-sensitivity defect metrology at the vendors' sites is limiting progress in developing substrates for EWL.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 15003024
- Report Number(s):
- UCRL-JC-148082; TRN: US200420%%266
- Resource Relation:
- Journal Volume: 4688; Conference: SPIE Microlithography 2002, Santa Clara, CA (US), 03/05/2002--03/06/2002; Other Information: PBD: 12 Apr 2002
- Country of Publication:
- United States
- Language:
- English
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