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Title: A neural manufacturing a novel concept for processing modeling, monitoring and control

Conference ·
OSTI ID:135047

Semiconductor fabrication lines have become extremely costly, and achieving a good return from such a high capital investment requires efficient utilization of these expensive facilities. It is highly desirable to shorten processing development time, increase fabrication yield, enhance flexibility, improve quality, and minimize downtime. We propose that these ends can be achieved by applying recent advances in the areas of artificial neural networks, fuzzy logic, machine learning, and genetic algorithms. We use the term neural manufacturing to describe such applications. This paper describes our use of artificial neural networks to improve the monitoring and control of semiconductor process.

Research Organization:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
135047
Report Number(s):
UCRL-JC-121676; CONF-951043-1; ON: DE96002573; TRN: 95:008612
Resource Relation:
Conference: International conference and exhibit of the Instrument Society of America: measurement, control, and automation, Houston, TX (United States), 22-27 Oct 1995; Other Information: PBD: Oct 1995
Country of Publication:
United States
Language:
English