Method of forming high aspect ratio apertures
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patent
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January 2007 |
Complementary replacement of material
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patent
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July 2008 |
Method for manufacturing porous structure and method for forming pattern
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patent-application
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October 2006 |
TRILAYER RESIST SCHEME FOR GATE ETCHING APPLICATIONS
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patent-application
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April 2009 |
Method of Controlling Orientation of Domains in Block Copolymer Films
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patent-application
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July 2009 |
Method for Forming a Block Copolymer Pattern
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patent-application
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August 2011 |
Ordered Nanoscale Domains by Infiltration of Block Copolymers
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patent-application
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February 2012 |
SEQUENTIAL INFILTRATION SYNTHESIS FOR ADVANCED LITHOGRAPHY
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patent-application
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September 2012 |
Hierarchical self-assembly of metal nanostructures on diblock copolymer scaffolds
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journal
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December 2001 |
Hollow Inorganic Nanospheres and Nanotubes with Tunable Wall Thicknesses by Atomic Layer Deposition on Self-Assembled Polymeric Templates
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journal
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January 2007 |
UHV transmission electron microscopy on the reconstructed surface of (111) gold: I. General features
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journal
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November 1981 |
PRIME process for deep UV and E-beam lithography
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journal
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April 1990 |
Application of Plasmask R resist and the DESIRE process to lithography at 248 nm
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journal
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November 1990 |
Approaches to deep ultraviolet photolithography utilizing acid hardened resin photoresist systems
- Thackeray, James W.; Orsula, George W.; Bohland, John F.
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 7, Issue 6, Article No. 1620
https://doi.org/10.1116/1.584502
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journal
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November 1989 |
Optimized surface silylation of chemically amplified epoxidized photoresists for micromachining applications
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journal
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April 2010 |
Study of the fundamental contributions to line edge roughness in a 193 nm, top surface imaging system
- Somervell, Mark H.; Fryer, David S.; Osborn, Brian
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 18, Issue 5
https://doi.org/10.1116/1.1289547
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journal
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January 2000 |
Integrated Silylation and Dry Development of Resist for sub-0.15.MU.m Top Surface Imaging Applications.
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journal
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January 1998 |
Reduction of line edge roughness in the top surface imaging process
- Mori, Shigeyasu; Morisawa, Taku; Matsuzawa, Nobuyuki
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, Issue 6, Article No. 3739
https://doi.org/10.1116/1.590409
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journal
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November 1998 |
Optical Characterization and Process Control of Top Surface Imaging
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journal
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January 1999 |
Study of bilayer silylation process for 193 nm lithography using chemically amplified resist
- Satou, I.; Kuhara, K.; Endo, M.
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 17, Issue 6
https://doi.org/10.1116/1.591005
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journal
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January 1999 |
High sensitive negative silylation process for 193nm lithography
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journal
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June 2000 |
A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates
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journal
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May 2011 |
Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers
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journal
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September 2010 |
Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis
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journal
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July 2011 |
Etch properties of resists modified by sequential infiltration synthesis
- Tseng, Yu-Chih; Peng, Qing; Ocola, Leonidas E.
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Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 29, Issue 6, Article No. 06FG01
https://doi.org/10.1116/1.3640758
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journal
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November 2011 |
Two-Dimensional Liquid Phase and the px.sqroot.3 Phase of Alkanethiol Self-Assembled Monolayers on Au(111)
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journal
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October 1994 |
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
- Goldfarb, Dario L.; Mahorowala, Arpan P.; Gallatin, Gregg M.
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 22, Issue 2
https://doi.org/10.1116/1.1667513
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journal
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January 2004 |
Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication
- Oehrlein, Gottlieb S.; Phaneuf, Raymond J.; Graves, David B.
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Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 29, Issue 1
https://doi.org/10.1116/1.3532949
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journal
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January 2011 |
Mobility analysis of surface roughness scattering in FinFET devices
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journal
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August 2011 |
An experimentally validated analytical model for gate line-edge roughness (LER) effects on technology scaling
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journal
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June 2001 |
VDD scalability of FinFET SRAMs: Robustness of different design options against LER-induced variations
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journal
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September 2010 |
Statistical Modeling and Simulation of Threshold Variation Under Random Dopant Fluctuations and Line-Edge Roughness
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journal
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June 2011 |
Line edge roughness of sub-100 nm dense and isolated features: Experimental study
- Ma, Yuansheng; Tsvid, G.; Cerrina, Franco
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, Issue 6
https://doi.org/10.1116/1.1624254
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journal
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January 2003 |
Study on line edge roughness for electron beam acceleration voltages from 50 to 5 kV
- Rio, D.; Constancias, C.; Saied, M.
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 27, Issue 6
https://doi.org/10.1116/1.3253650
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journal
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January 2009 |
25 nm mechanically buttressed high aspect ratio zone plates: Fabrication and performance
- Olynick, Deirdre L.; Harteneck, Bruce D.; Veklerov, Eugene
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 22, Issue 6
https://doi.org/10.1116/1.1815298
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journal
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January 2004 |