A study of Ag/Ag(100) thin film growth with scanning tunneling microscopy
- Iowa State Univ., Ames, IA (United States)
Thin films are attracting more and more attention in both the industrial and scientific communities. Many applications of thin films have been developed in industry. By using various growth methods, thin films can be used in optics, microelectronic devices, magnetic recording media, and as protective coatings. In order to improve existing applications and to find new ones, it is essential to understand what makes them so useful in applications and what factors affect their properties. Therefore, an understanding of film growth processes is necessary. Scientifically, many fundamental interactions, such as the interaction between the atoms that comprise the film and substrate, or the interaction between film atoms, are of great interest to surface scientists; studies of these interactions can provide dramatic insights into the nature of thin films and therefore, can further drive technology forward. In every application, the film structures, including morphology and microstructure, and adhesion between film and substrate are critical to the film`s properties and therefore its performance. Studies of the mechanisms that control film morphology, microstructure and adhesion thus are important. Film growth kinetics can provide important information regarding the film structure and adhesion. Film growth is an atomistic process. The chemistry and physics of the system can be better understood if the information provided is at an atomic level.
- Research Organization:
- Ames Lab., Ames, IA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-7405-ENG-82
- OSTI ID:
- 130657
- Report Number(s):
- IS-T-1762; ON: DE96002248; TRN: 95:008302
- Resource Relation:
- Other Information: TH: Thesis (Ph.D.); PBD: 1995
- Country of Publication:
- United States
- Language:
- English
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