Parallel stitching of 2D materials
- Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- National Tsing-Hua Univ., Hsinchu (Taiwan)
Diverse parallel stitched 2D heterostructures, including metal–semiconductor, semiconductor–semiconductor, and insulator–semiconductor, are synthesized directly through selective “sowing” of aromatic molecules as the seeds in the chemical vapor deposition (CVD) method. Lastly, the methodology enables the large-scale fabrication of lateral heterostructures, which offers tremendous potential for its application in integrated circuits.
- Research Organization:
- Brookhaven National Laboratory (BNL), Upton, NY (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- SC0012704
- OSTI ID:
- 1255728
- Report Number(s):
- BNL-112246-2016-JA; R&D Project: MA015MACA; KC0201010
- Journal Information:
- Advanced Materials, Vol. 28, Issue 12; ISSN 0935-9648
- Publisher:
- WileyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 175 works
Citation information provided by
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