Selective layer disordering in intersubband Al0.028Ga0.972 N/AlN superlattices with silicon nitride capping layer
Journal Article
·
· Applied Physics Express
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
We demonstrate the selective layer disordering in intersubband Al0.028Ga0.972 N/AlN superlattices using a silicon nitride (SiNx) capping layer. The (SiNx) capped superlattice exhibits suppressed layer disordering under high-temperature annealing. In addition, the rate of layer disordering is reduced with increased SiNx thickness. The layer disordering is caused by Si diffusion, and the SiNx layer inhibits vacancy formation at the crystal surface and ultimately, the movement of Al and Ga atoms across the heterointerfaces. In conclusion, patterning of the SiNx layer results in selective layer disordering, an attractive method to integrate active and passive III–nitride-based intersubband devices.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA)
- Grant/Contract Number:
- AC04-94AL85000
- OSTI ID:
- 1248572
- Report Number(s):
- SAND-2016-0433J; 618634
- Journal Information:
- Applied Physics Express, Vol. 8, Issue 6; ISSN 1882-0778
- Publisher:
- Japan Society of Applied PhysicsCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 2 works
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