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Title: In situ spectroscopic study of the plastic deformation of amorphous silicon under nonhydrostatic conditions induced by indentation

Journal Article · · Physical Review. B, Condensed Matter and Materials Physics
 [1];  [2];  [3];  [4];  [2]
  1. National Institute of Standards and Technology (NIST), Gaithersburg, MD (United States); Univ. of Maryland, College Park, MD (United States)
  2. National Institute of Standards and Technology (NIST), Gaithersburg, MD (United States)
  3. Australian National Univ., Canberra (Australia)
  4. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)

Indentation-induced plastic deformation of amorphous silicon (a-Si) thin films was studied by in situ Raman imaging of the deformed contact region of an indented sample, employing a Raman spectroscopy-enhanced instrumented indentation technique (IIT). The occurrence and evolving spatial distribution of changes in the a-Si structure caused by processes, such as polyamorphization and crystallization, induced by indentation loading were observed. Furthermore, the obtained experimental results are linked with previously published work on the plastic deformation of a-Si under hydrostatic compression and shear deformation to establish a model for the deformation behavior of a-Si under indentation loading.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
AC05-00OR22725; 7620
OSTI ID:
1237635
Alternate ID(s):
OSTI ID: 1234065
Journal Information:
Physical Review. B, Condensed Matter and Materials Physics, Vol. 92, Issue 21; ISSN 1098-0121
Publisher:
American Physical Society (APS)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 24 works
Citation information provided by
Web of Science

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Cited By (2)

A Review on Micro- and Nanoscratching/Tribology at High Temperatures: Instrumentation and Experimentation journal July 2018
In-situ high temperature micro-Raman investigation of annealing behavior of high-pressure phases of Si journal June 2019

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