In situ spectroscopic study of the plastic deformation of amorphous silicon under nonhydrostatic conditions induced by indentation
Journal Article
·
· Physical Review. B, Condensed Matter and Materials Physics
- National Institute of Standards and Technology (NIST), Gaithersburg, MD (United States); Univ. of Maryland, College Park, MD (United States)
- National Institute of Standards and Technology (NIST), Gaithersburg, MD (United States)
- Australian National Univ., Canberra (Australia)
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Indentation-induced plastic deformation of amorphous silicon (a-Si) thin films was studied by in situ Raman imaging of the deformed contact region of an indented sample, employing a Raman spectroscopy-enhanced instrumented indentation technique (IIT). The occurrence and evolving spatial distribution of changes in the a-Si structure caused by processes, such as polyamorphization and crystallization, induced by indentation loading were observed. Furthermore, the obtained experimental results are linked with previously published work on the plastic deformation of a-Si under hydrostatic compression and shear deformation to establish a model for the deformation behavior of a-Si under indentation loading.
- Research Organization:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- AC05-00OR22725; 7620
- OSTI ID:
- 1237635
- Alternate ID(s):
- OSTI ID: 1234065
- Journal Information:
- Physical Review. B, Condensed Matter and Materials Physics, Vol. 92, Issue 21; ISSN 1098-0121
- Publisher:
- American Physical Society (APS)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 24 works
Citation information provided by
Web of Science
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