Studying Resist Stochastics with the Multivariate Poisson Propagation Model
Journal Article
·
· Journal of Photopolymer Science and Technology
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Center for X-ray Optics
- Univ. of California, Berkeley, CA (United States). EECS
Progress in the ultimate performance of extreme ultraviolet resist has arguably decelerated in recent years suggesting an approach to stochastic limits both in photon counts and material parameters. Here we report on the performance of a variety of leading extreme ultraviolet resist both with and without chemical amplification. The measured performance is compared to stochastic modeling results using the Multivariate Poisson Propagation Model. The results show that the best materials are indeed nearing modeled performance limits.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States). Materials Sciences Division
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- AC02-05CH11231
- OSTI ID:
- 1234543
- Report Number(s):
- LBNL-186922; JSTEEW; ir:186922
- Journal Information:
- Journal of Photopolymer Science and Technology, Vol. 27, Issue 6; ISSN 0914-9244
- Publisher:
- The Society of Photopolymer Science and Technology (SPST)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 8 works
Citation information provided by
Web of Science
Web of Science
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