Strain-relaxation and critical thickness of epitaxial La1.85Sr0.15CuO4 films
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Univ. of Tennessee, Knoxville, TN (United States)
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Pusan National Univ., Busan (Korea, Republic of); Univ. of Tennessee, Knoxville, TN (United States)
We report the thickness-dependent strain-relaxation behavior and the associated impacts upon the superconductivity in epitaxial La1.85Sr0.15CuO4 films grown on different substrates, which provide a range of strain. We have found that the critical thickness for the onset of superconductivity in La1.85Sr0.15CuO4 films is associated with the finite thickness effect and epitaxial strain. In particular, thin films with tensile strain greater than ~0.25% revealed no superconductivity. We attribute this phenomenon to the inherent formation of oxygen vacancies that can be minimized via strain relaxation.
- Research Organization:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- Grant/Contract Number:
- AC05-00OR22725
- OSTI ID:
- 1234342
- Journal Information:
- APL Materials, Vol. 3; ISSN 2166-532X
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 25 works
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