Atomic oxygen interaction with nickel multilayer and antimony oxide doped MoS{sub 2} films
Sputtered MoS{sub 2} is a solid lubricant capable of ultralow friction coefficients (below 0.05) load-bearing capacity. Since it exhibits low friction in vacuum, low outgassing rate, is non-migrating and lacks organic binders, this material is an attractive lubricant for space mechanisms. To exploit these new materials to their fullest potential, designers of space-based motion systems require data on the effects of atomic oxygen exposure on dense, sputtered MoS{sub 2}. This paper describes the effects of atomic oxygen in low earth orbit on the friction and surface composition of sputtered MoS{sub 2} films. Sputtered multilayer films of MoS{sub 2} with nickel (0.7 nm Ni per 10 nm MoS{sub 2}, for 1 {mu}m total film thickness), and MoS{sub 2} cosputtered with antimony oxide (nominally 2 {mu}m thick) were exposed to 2.2 to 2.5 x 10{sup 20} oxygen/cm{sup 2} over a period of 42.25 hours in earth orbit on the United States space shuttle. Identical specimens were kept as controls in desiccated storage for the duration of the mission, and another set was exposed to an equivalent fluence of atomic oxygen in the laboratory. The friction coefficient in air and vacuum, and the composition of worn surfaces, were determined prior to the shuttle flight and again after the shuttle flight. Results are described.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 123246
- Report Number(s):
- SAND-94-0606C; CONF-941012-1; ON: DE96001938; TRN: 95:008022
- Resource Relation:
- Conference: Joint American Society of Mechanical Engineers/Society of Tribologists and Lubrication Engineers tribology conference, Honolulu, HI (United States), 16-19 Oct 1994; Other Information: PBD: 1994
- Country of Publication:
- United States
- Language:
- English
Similar Records
Atomic oxygen-MoS/sub 2/ chemical interactions
Ion-beam-assisted deposition of MoS2 and other low-friction films. Interim report, Jun 88-Jun 92