A novel condenser for EUV lithography ring-field projection optics
A condenser for a ring-field extreme ultra-violet (EUV) projection lithography camera is presented. The condenser consists of a gently undulating mirror, that we refer to as a ripple plate, and which is illuminated by a collimated beam at grazing incidence. The light is incident along the ripples rather than across them, so that the incident beam is reflected onto a cone and subsequently focused on to the arc of the ring field. A quasistationary illumination is achieved, since any one field point receives light from points on the ripples, which are distributed throughout the condenser pupil. The design concept can easily be applied to illuminate projection cameras with various ring-field and numerical aperture specifications. Ray-tracing results are presented of a condenser for a 0.25 NA EUV projection camera.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE Office of Defense Programs (DP) (US)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 11971
- Report Number(s):
- UCRL-JC-133281; TRN: AH200119%%153
- Resource Relation:
- Conference: 44th Annual Meeting of the International Symposium on Optical Science, Engineering, and Instrumentation, Society of Photo-Optical Instrumentation Engineers, Denver, CO (US), 07/19/1999--07/23/1999; Other Information: PBD: 15 Jul 1999
- Country of Publication:
- United States
- Language:
- English
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