skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Evaluation of the SEI using a multilayer spectroscopic ellipsometry model

Journal Article · · ECS Electrochemistry Letters
DOI:https://doi.org/10.1149/2.0031411eel· OSTI ID:1193712
 [1]
  1. Idaho National Lab. (INL), Idaho Falls, ID (United States)

A multilayer spectroscopic ellipsometry (SE) model has been developed to characterize SEI formation. The model, which consists of two Cauchy layers, is constructed with an inner layer meant to model primarily inorganic compounds adjacent to an electrode and an outer layer which mirrors polymeric, organic constituents on the exterior of the SEI. Comparison of 1:1 EC:EMC and 1:4 EC:EMC with 1.0 M LiPF₆ shows distinct differences in the two modeled layers. The data suggest that the thickness of both layers change over a wide potential range. These changes have been linked with other reports on the growth of the SEI.

Research Organization:
Idaho National Lab. (INL), Idaho Falls, ID (United States)
Sponsoring Organization:
USDOE
Grant/Contract Number:
AC07-05ID14517
OSTI ID:
1193712
Report Number(s):
INL/JOU-14-31952
Journal Information:
ECS Electrochemistry Letters, Vol. 3, Issue 11; ISSN 2162-8726
Publisher:
Electrochemical SocietyCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 3 works
Citation information provided by
Web of Science

Similar Records

Evaluation of the SEI using a multilayer spectroscopic ellipsometry model
Journal Article · Fri Aug 01 00:00:00 EDT 2014 · ECS Electrochemistry Letters · OSTI ID:1193712

Characterization of SEI layers on LiMn2O4 cathodes with in-situ spectroscopic ellipsometry
Technical Report · Mon Aug 30 00:00:00 EDT 2004 · OSTI ID:1193712

Thickness determination of metal thin films with spectroscopic ellipsometry for x-ray mirror and multilayer applications. [Au; Pt; Pd; Cr; W; Cu]
Journal Article · Wed Sep 01 00:00:00 EDT 1999 · Journal of Vacuum Science and Technology, A · OSTI ID:1193712

Related Subjects