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Title: Gas cleaning system and method

Patent ·
OSTI ID:1175772

A gas cleaning system for removing at least a portion of contaminants, such as halides, sulfur, particulates, mercury, and others, from a synthesis gas (syngas). The gas cleaning system may include one or more filter vessels coupled in series for removing halides, particulates, and sulfur from the syngas. The gas cleaning system may be operated by receiving gas at a first temperature and pressure and dropping the temperature of the syngas as the gas flows through the system. The gas cleaning system may be used for an application requiring clean syngas, such as, but not limited to, fuel cell power generation, IGCC power generation, and chemical synthesis.

Research Organization:
Siemens Power Generation, Inc., Orlando, FL, (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC26-99FT40674
Assignee:
Siemens Power Generation, Inc.
Patent Number(s):
7,056,487
Application Number:
10/456,037
OSTI ID:
1175772
Country of Publication:
United States
Language:
English

References (1)

Novel Gas Cleaning/Conditioning for Integrated Gasification Combined Cycle report August 2001

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