Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge
Patent
·
OSTI ID:1175695
Apparatus for the processing of materials involving placing a material either placed between an radio-frequency electrode and a ground electrode, or which is itself one of the electrodes. This is done in atmospheric pressure conditions. The apparatus effectively etches or cleans substrates, such as silicon wafers, or provides cleaning of spools and drums, and uses a gas containing an inert gas and a chemically reactive gas.
- Research Organization:
- Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-7405-ENG-36
- Assignee:
- The Regents of the University of California (Los Alamos, NM)
- Patent Number(s):
- 7,025,856
- Application Number:
- 09/776,086
- OSTI ID:
- 1175695
- Country of Publication:
- United States
- Language:
- English
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