Method for the fabrication of three-dimensional microstructures by deep X-ray lithography

Sweatt, William C.; Christenson, Todd R.

Title: Method for the fabrication of three-dimensional microstructures by deep X-ray lithography

Patent · Tue Apr 05 00:00:00 EDT 2005

OSTI ID:1175306

Sweatt, William C.; Christenson, Todd R.

A method for the fabrication of three-dimensional microstructures by deep X-ray lithography (DXRL) comprises a masking process that uses a patterned mask with inclined mask holes and off-normal exposures with a DXRL beam aligned with the inclined mask holes. Microstructural features that are oriented in different directions can be obtained by using multiple off-normal exposures through additional mask holes having different orientations. Various methods can be used to block the non-aligned mask holes from the beam when using multiple exposures. A method for fabricating a precision 3D X-ray mask comprises forming an intermediate mask and a master mask on a common support membrane.

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Research Organization:: Sandia National Lab. (SNL-CA), Livermore, CA (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: AC04-94AL85000

Assignee:: Sandia Corporation

Patent Number(s):: 6,875,544

Application Number:: 10/264,536

OSTI ID:: 1175306

Country of Publication:: United States

Language:: English

References (11)

Fabrication of photonic crystals by deep x-ray lithography Feiertag, G.; Ehrfeld, W.; Freimuth, H. Applied Physics Letters, Vol. 71, Issue 11 https://doi.org/10.1063/1.120431	journal	September 1997
40 keV shaped electron beam lithography for LIGA intermediate mask fabrication Lüttge, R.; Adam, D.; Burkhardt, F. Microelectronic Engineering, Vol. 46, Issue 1-4 https://doi.org/10.1016/S0167-9317(99)00073-8	journal	May 1999
Fabrication of three-dimensional photonic structures with submicrometer resolution by x-ray lithography Cuisin, C.; Chelnokov, A.; Lourtioz, J. -M. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 18, Issue 6 https://doi.org/10.1116/1.1319825	journal	January 2000
Recent developments in deep x-ray lithography Ehrfeld, Wolfgang Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, Issue 6 https://doi.org/10.1116/1.590490	journal	November 1998
Sub-micrometre dielectric and metallic yablonovite structures fabricated from resist templates Cuisin, C.; Chelnokov, A.; Decanini, D. Optical and Quantum Electronics, Vol. 34, Issue 1/3, p. 13-26 https://doi.org/10.1023/A:1013381318826	journal	January 2002
Photonic band structure: The face-centered-cubic case employing nonspherical atoms Yablonovitch, E.; Gmitter, T.; Leung, K. Physical Review Letters, Vol. 67, Issue 17 https://doi.org/10.1103/PhysRevLett.67.2295	journal	October 1991
Submicrometer resolution Yablonovite templates fabricated by x-ray lithography Cuisin, C.; Chelnokov, A.; Lourtioz, J. -M. Applied Physics Letters, Vol. 77, Issue 6 https://doi.org/10.1063/1.1306646	journal	August 2000
High precision mask fabrication for deep X-ray lithography using 40-kV shaped electron beam lithography Schmidt, Andreas; Himmelsbach, Gerhard; Lüttge, Regina Microelectronic Engineering, Vol. 57-58 https://doi.org/10.1016/S0167-9317(01)00479-8	journal	September 2001
A tetrahedral three-facet micro mirror with the inclined deep X-ray process Oh, Dong-Young; Gil, Kyehwan; Chang, Suk Sang Sensors and Actuators A: Physical, Vol. 93, Issue 2 https://doi.org/10.1016/S0924-4247(01)00645-8	journal	September 2001
Materials of LIGA technology Ehrfeld, W.; Hessel, V.; Löwe, H. Microsystem Technologies, Vol. 5, Issue 3 https://doi.org/10.1007/s005420050150	journal	February 1999
Fabrication of three-dimensional microstructures by high resolution x-ray lithography Cuisin, C.; Chen, Y.; Decanini, D. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 17, Issue 6 https://doi.org/10.1116/1.591027	journal	January 1999

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