Method & apparatus for monitoring plasma processing operations

Patent · Tue Oct 19 00:00:00 EDT 2004

OSTI ID:1175081

Smith, Jr., Michael Lane; Ward, Pamela Denise; Stevenson, Joel O'Don

The invention generally relates to various aspects of a plasma process and, more specifically, to the monitoring of such plasma processes. One aspect relates to a plasma monitoring module that may be adjusted in at least some manner so as to re-evaluate a previously monitored plasma process. For instance, optical emissions data on a plasma process that was previously monitored by the plasma monitoring module may be replayed through the plasma monitoring module after making at least one adjustment in relation to the plasma monitoring module.

• Research Organization: Sandia National Lab. (SNL-CA), Livermore, CA (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC04-94AL85000
• Assignee: Sandia Corporation
• Patent Number(s): 6,805,810
• Application Number: 10/108,193
• OSTI ID: 1175081
• Country of Publication: United States
• Language: English

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