Self-cleaning optic for extreme ultraviolet lithography

Patent · Tue Dec 16 00:00:00 EST 2003

OSTI ID:1174631

Klebanoff, Leonard E.; Stulen, Richard H.

A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or "capping" layer which in combination with incident radiation and gaseous molecular species such as O.sub.2, H.sub.2, H.sub.2 O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.

• Research Organization: Sandia National Lab. (SNL-CA), Livermore, CA (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC04-94AL85000
• Assignee: EUV LLC (Santa Clara, CA)
• Patent Number(s): 6,664,554
• Application Number: 09/754,869
• OSTI ID: 1174631
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING