Temporal stability of Y Ba Cu O nano Josephson junctions from ion irradiation
Journal Article
·
· IEEE Transactions on Applied Superconductivity
OSTI ID:1172666
We investigate the temporal stability of YBa2Cu3O7 Josephson junctions created by ion irradiation through a nano-scale implant mask fabricated using electron beam lithography and reactive ion etching. A comparison of current-voltage characteristics measured for junctions after fabrication and eight years of storage at room temperature show a slight decrease in critical current and increase in normal state resistance consistent with broadening of the weaklink from diffusion of defects. Shapiro step measurements performed 8 years after fabrication reveal that device uniformity is maintained and is strong evidence that these devices have excellent temporal stability for applications.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- DE-AC02-05CH11231
- OSTI ID:
- 1172666
- Report Number(s):
- LBNL-6088E
- Journal Information:
- IEEE Transactions on Applied Superconductivity, Journal Name: IEEE Transactions on Applied Superconductivity
- Country of Publication:
- United States
- Language:
- English
Similar Records
Large voltage modulation in magnetic field sensors from two-dimensional arrays of Y-Ba-Cu-O nano Josephson junctions
Combined method of electron-beam lithography and ion implantation techniques for the fabrication of high-temperature superconductor Josephson junctions
Very Large Scale Integration of Nano-Patterned YBa2Cu3O7-delta Josephson Junctions in a Two-Dimensional Array
Journal Article
·
Mon Feb 10 00:00:00 EST 2014
· Applied Physics Letters
·
OSTI ID:1172666
+7 more
Combined method of electron-beam lithography and ion implantation techniques for the fabrication of high-temperature superconductor Josephson junctions
Journal Article
·
Fri Nov 01 00:00:00 EST 1996
· Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
·
OSTI ID:1172666
+3 more
Very Large Scale Integration of Nano-Patterned YBa2Cu3O7-delta Josephson Junctions in a Two-Dimensional Array
Journal Article
·
Tue Sep 01 00:00:00 EDT 2009
· Nano Letters
·
OSTI ID:1172666
+2 more