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Title: The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope

Authors:
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Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1164382
Report Number(s):
LBNL-6517E
DOE Contract Number:  
DE-AC02-05CH11231
Resource Type:
Journal Article
Journal Name:
Proc. SPIE
Additional Journal Information:
Journal Volume: 8880; Related Information: Journal Publication Date: Sept. 2013
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Goldberg, Kenneth A., Mochi, Iacopo, Benk, Markus P., Lin, Chihcheng, Allezy, Arnaud, Dickinson, Michael, Cork, Carl W., Macdougall, James B., Anderson, Erik H., Chao, Weilun, Salmassi, Farhad, Gullikson, Eric. M., Zehm, Daniel, Vytla, Vamsi, Cork, William, DePonte, Jason, Picchi, Gino, Pekedis, Ahmet, Katayanagi, Takeshi, Jones, Michael G., Martin, Elizabeth, Naulleau, Patrick P., and Rekawa, Senajith B. The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope. United States: N. p., 2013. Web. doi:10.1117/12.2026496.
Goldberg, Kenneth A., Mochi, Iacopo, Benk, Markus P., Lin, Chihcheng, Allezy, Arnaud, Dickinson, Michael, Cork, Carl W., Macdougall, James B., Anderson, Erik H., Chao, Weilun, Salmassi, Farhad, Gullikson, Eric. M., Zehm, Daniel, Vytla, Vamsi, Cork, William, DePonte, Jason, Picchi, Gino, Pekedis, Ahmet, Katayanagi, Takeshi, Jones, Michael G., Martin, Elizabeth, Naulleau, Patrick P., & Rekawa, Senajith B. The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope. United States. https://doi.org/10.1117/12.2026496
Goldberg, Kenneth A., Mochi, Iacopo, Benk, Markus P., Lin, Chihcheng, Allezy, Arnaud, Dickinson, Michael, Cork, Carl W., Macdougall, James B., Anderson, Erik H., Chao, Weilun, Salmassi, Farhad, Gullikson, Eric. M., Zehm, Daniel, Vytla, Vamsi, Cork, William, DePonte, Jason, Picchi, Gino, Pekedis, Ahmet, Katayanagi, Takeshi, Jones, Michael G., Martin, Elizabeth, Naulleau, Patrick P., and Rekawa, Senajith B. 2013. "The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope". United States. https://doi.org/10.1117/12.2026496. https://www.osti.gov/servlets/purl/1164382.
@article{osti_1164382,
title = {The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope},
author = {Goldberg, Kenneth A. and Mochi, Iacopo and Benk, Markus P. and Lin, Chihcheng and Allezy, Arnaud and Dickinson, Michael and Cork, Carl W. and Macdougall, James B. and Anderson, Erik H. and Chao, Weilun and Salmassi, Farhad and Gullikson, Eric. M. and Zehm, Daniel and Vytla, Vamsi and Cork, William and DePonte, Jason and Picchi, Gino and Pekedis, Ahmet and Katayanagi, Takeshi and Jones, Michael G. and Martin, Elizabeth and Naulleau, Patrick P. and Rekawa, Senajith B.},
abstractNote = {},
doi = {10.1117/12.2026496},
url = {https://www.osti.gov/biblio/1164382}, journal = {Proc. SPIE},
number = ,
volume = 8880,
place = {United States},
year = {Mon Sep 02 00:00:00 EDT 2013},
month = {Mon Sep 02 00:00:00 EDT 2013}
}