The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope
- Authors:
- more »
- Publication Date:
- Research Org.:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC)
- OSTI Identifier:
- 1164382
- Report Number(s):
- LBNL-6517E
- DOE Contract Number:
- DE-AC02-05CH11231
- Resource Type:
- Journal Article
- Journal Name:
- Proc. SPIE
- Additional Journal Information:
- Journal Volume: 8880; Related Information: Journal Publication Date: Sept. 2013
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Goldberg, Kenneth A., Mochi, Iacopo, Benk, Markus P., Lin, Chihcheng, Allezy, Arnaud, Dickinson, Michael, Cork, Carl W., Macdougall, James B., Anderson, Erik H., Chao, Weilun, Salmassi, Farhad, Gullikson, Eric. M., Zehm, Daniel, Vytla, Vamsi, Cork, William, DePonte, Jason, Picchi, Gino, Pekedis, Ahmet, Katayanagi, Takeshi, Jones, Michael G., Martin, Elizabeth, Naulleau, Patrick P., and Rekawa, Senajith B. The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope. United States: N. p., 2013.
Web. doi:10.1117/12.2026496.
Goldberg, Kenneth A., Mochi, Iacopo, Benk, Markus P., Lin, Chihcheng, Allezy, Arnaud, Dickinson, Michael, Cork, Carl W., Macdougall, James B., Anderson, Erik H., Chao, Weilun, Salmassi, Farhad, Gullikson, Eric. M., Zehm, Daniel, Vytla, Vamsi, Cork, William, DePonte, Jason, Picchi, Gino, Pekedis, Ahmet, Katayanagi, Takeshi, Jones, Michael G., Martin, Elizabeth, Naulleau, Patrick P., & Rekawa, Senajith B. The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope. United States. https://doi.org/10.1117/12.2026496
Goldberg, Kenneth A., Mochi, Iacopo, Benk, Markus P., Lin, Chihcheng, Allezy, Arnaud, Dickinson, Michael, Cork, Carl W., Macdougall, James B., Anderson, Erik H., Chao, Weilun, Salmassi, Farhad, Gullikson, Eric. M., Zehm, Daniel, Vytla, Vamsi, Cork, William, DePonte, Jason, Picchi, Gino, Pekedis, Ahmet, Katayanagi, Takeshi, Jones, Michael G., Martin, Elizabeth, Naulleau, Patrick P., and Rekawa, Senajith B. 2013.
"The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope". United States. https://doi.org/10.1117/12.2026496. https://www.osti.gov/servlets/purl/1164382.
@article{osti_1164382,
title = {The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope},
author = {Goldberg, Kenneth A. and Mochi, Iacopo and Benk, Markus P. and Lin, Chihcheng and Allezy, Arnaud and Dickinson, Michael and Cork, Carl W. and Macdougall, James B. and Anderson, Erik H. and Chao, Weilun and Salmassi, Farhad and Gullikson, Eric. M. and Zehm, Daniel and Vytla, Vamsi and Cork, William and DePonte, Jason and Picchi, Gino and Pekedis, Ahmet and Katayanagi, Takeshi and Jones, Michael G. and Martin, Elizabeth and Naulleau, Patrick P. and Rekawa, Senajith B.},
abstractNote = {},
doi = {10.1117/12.2026496},
url = {https://www.osti.gov/biblio/1164382},
journal = {Proc. SPIE},
number = ,
volume = 8880,
place = {United States},
year = {Mon Sep 02 00:00:00 EDT 2013},
month = {Mon Sep 02 00:00:00 EDT 2013}
}
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