Plasma Processing of Large Surfaces with Application to SRF Cavity Modification
Plasma based surface modifications of SRF cavities present promising alternatives to the wet etching technology currently applied. To understand and characterize the plasma properties and chemical kinetics of plasma etching processes inside a single cell cavity, we have built a specially-designed cylindrical cavity with 8 observation ports. These ports can be used for holding niobium samples and diagnostic purposes simultaneously. Two frequencies (13.56 MHz and 2.45 GHz) of power source are used for different pressure, power and gas compositions. The plasma parameters were evaluated by a Langmuir probe and by an optical emission spectroscopy technique based on the relative intensity of two Ar 5p-4s lines at 419.8 and 420.07 nm. Argon 5p-4s transition is chosen to determine electron temperature in order to optimize parameters for plasma processing. Chemical kinetics of the process was observed using real-time mass spectroscopy. The effect of these parameters on niobium surface would be measured, presented at this conference, and used as guidelines for optimal design of SRF etching process.
- Research Organization:
- Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- AC05-06OR23177
- OSTI ID:
- 1164363
- Report Number(s):
- JLAB-ACC-13-1804; DOE/OR/23177-3232
- Resource Relation:
- Conference: SRF 2013, 23-27 Sept 2013. Paris, France
- Country of Publication:
- United States
- Language:
- English
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