Fabrication of aluminum nitride and its stability in liquid alkali metals
- Argonne National Lab., Chicago, IL (United States)
The objective of this task are to (a) evaluate several fabrication procedures for development of aluminum nitride (AlN) coatings on the candidate first-wall structural material V-5wt.%Cr-5wt.%Ti, (b) evaluate the stability of coatings in contact with the structural alloy and liquid Li at temperatures of 200 to 400{degrees}C, (c) measure the electrical resistivity of the coated films after exposure to liquid Li, (d) evaluate the effects of coating defects on electrical resistivity, and (e) establish in-situ repair procedures to maintain adequate electrical insulating properties for the coatings.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- OSTI ID:
- 115712
- Report Number(s):
- DOE/ER-0313/17; ON: DE95013663; TRN: 95:022902
- Resource Relation:
- Other Information: PBD: Apr 1995; Related Information: Is Part Of Fusion materials semiannual progress report for the period ending September 30, 1994; PB: 390 p.
- Country of Publication:
- United States
- Language:
- English
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