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Title: Ion beam sputter target and method of manufacture

Patent ·
OSTI ID:1156819
; ; ; ; ; ;

A target for use in an ion beam sputtering apparatus made of at least two target tiles where at least two of the target tiles are made of different chemical compositions and are mounted on a main tile and geometrically arranged on the main tile to yield a desired chemical composition on a sputtered substrate. In an alternate embodiment, the tiles are of varied thickness according to the desired chemical properties of the sputtered film. In yet another alternate embodiment, the target is comprised of plugs pressed in a green state which are disposed in cavities formed in a main tile also formed in a green state and the assembly can then be compacted and then sintered.

Research Organization:
National Renewable Energy Laboratory (NREL), Golden, CO (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
FG36-06GO1605
Assignee:
GFO
Patent Number(s):
8,821,701
Application Number:
12/792,324
OSTI ID:
1156819
Country of Publication:
United States
Language:
English

References (25)

Target for sputtering patent September 1986
Process for equipment to coat tools for machining and forming techniques with mechanically resistant layers patent October 1989
Target source for ion beam sputter deposition patent April 1990
Process and apparatus for depositing coatings of high electrical resistance by cathode sputtering patent January 1991
Facing targets sputtering device patent March 1991
Sputtering target patent March 1993
Method and device for sputtering of films patent August 1993
Wear resistant coating films and their coated articles patent June 1994
Mosaic target patent November 1995
PVD sputter system having nonplanar target configuration and methods for constructing same patent December 1996
Spark eliminating sputtering target and method for using and making same patent July 1999
Semiconductor device having a ternary compound low resistive electrode patent December 1999
Plasma enhancement apparatus and method for physical vapor deposition patent October 2000
Method and device for PVD coating patent March 2002
Method and apparatus for thin film deposition using an active shutter patent September 2002
Process for preparing a target for use in the production of a thin metal oxide film patent July 2003
Method and system for physically-assisted chemical-vapor deposition patent July 2003
Process for producing thin metal oxide film patent September 2004
Sputter target and method of using a sputter target patent February 2005
Process for producing a hard-material-coated component patent March 2005
Methods of forming aluminum-comprising physical vapor deposition targets; sputtered films; and target constructions patent March 2006
Mixed germanium-silicon thermal control blanket patent September 2007
Staggered target tiles patent June 2009
Friction- and wear-reducing coating patent October 2011
Target tiles in a staggered array patent-application January 2006

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