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Title: Method to grow group III-nitrides on copper using passivation layers

Patent ·
OSTI ID:1133649

Group III-nitride epilayers can be grown directly on copper substrates using intermediate passivation layers. For example, single crystalline c-plane GaN can be grown on Cu (110) substrates with MOCVD. The growth relies on a low temperature AlN passivation layer to isolate any alloying reaction between Ga and Cu.

Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
8,741,748
Application Number:
13/836,594
OSTI ID:
1133649
Country of Publication:
United States
Language:
English

References (1)

Epitaxial growth of GaN on copper substrates journal June 2006