Apparatus and method for deterministic control of surface figure during full aperture polishing
Abstract
A polishing system configured to polish a lap includes a lap configured to contact a workpiece for polishing the workpiece; and a septum configured to contact the lap. The septum has an aperture formed therein. The radius of the aperture and radius the workpiece are substantially the same. The aperture and the workpiece have centers disposed at substantially the same radial distance from a center of the lap. The aperture is disposed along a first radial direction from the center of the lap, and the workpiece is disposed along a second radial direction from the center of the lap. The first and second radial directions may be opposite directions.
- Inventors:
- Publication Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1108608
- Patent Number(s):
- 8,588,956
- Application Number:
- 12/695,986
- Assignee:
- LLNL
- DOE Contract Number:
- AC52-07NA27344
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING
Citation Formats
Suratwala, Tayyab Ishaq, Feit, Michael Dennis, and Steele, William Augustus. Apparatus and method for deterministic control of surface figure during full aperture polishing. United States: N. p., 2013.
Web.
Suratwala, Tayyab Ishaq, Feit, Michael Dennis, & Steele, William Augustus. Apparatus and method for deterministic control of surface figure during full aperture polishing. United States.
Suratwala, Tayyab Ishaq, Feit, Michael Dennis, and Steele, William Augustus. 2013.
"Apparatus and method for deterministic control of surface figure during full aperture polishing". United States. https://www.osti.gov/servlets/purl/1108608.
@article{osti_1108608,
title = {Apparatus and method for deterministic control of surface figure during full aperture polishing},
author = {Suratwala, Tayyab Ishaq and Feit, Michael Dennis and Steele, William Augustus},
abstractNote = {A polishing system configured to polish a lap includes a lap configured to contact a workpiece for polishing the workpiece; and a septum configured to contact the lap. The septum has an aperture formed therein. The radius of the aperture and radius the workpiece are substantially the same. The aperture and the workpiece have centers disposed at substantially the same radial distance from a center of the lap. The aperture is disposed along a first radial direction from the center of the lap, and the workpiece is disposed along a second radial direction from the center of the lap. The first and second radial directions may be opposite directions.},
doi = {},
url = {https://www.osti.gov/biblio/1108608},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Nov 19 00:00:00 EST 2013},
month = {Tue Nov 19 00:00:00 EST 2013}
}
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