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Title: Methods for globally treating silica optics to reduce optical damage

Patent ·
OSTI ID:1080314
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A method for preventing damage caused by high intensity light sources to optical components includes annealing the optical component for a predetermined period. Another method includes etching the optical component in an etchant including fluoride and bi-fluoride ions. The method also includes ultrasonically agitating the etching solution during the process followed by rinsing of the optical component in a rinse bath.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC52-07NA27344
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
Patent Number(s):
8,313,662
Application Number:
12/572,220
OSTI ID:
1080314
Country of Publication:
United States
Language:
English

References (4)

Wet chemical etching of silicate glasses in hydrofluoric acid based solutions journal December 1993
Cleaning of Substrate Surfaces book January 1999
Solvent and ligand effects on the optical properties of silver nanoparticles in silica sol-gel films conference August 2009
Laser damage precursors in fused silica
  • Miller, P. E.; Suratwala, T. I.; Bude, J. D.
  • Laser Damage Symposium XLI: Annual Symposium on Optical Materials for High Power Lasers, SPIE Proceedings https://doi.org/10.1117/12.836986
conference December 2009

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36 MATERIALS SCIENCE