Ultraviolet photosensitivity of sulfur-doped micro- and nano-crystalline diamond

Mendoza, Frank; Makarov, Vladimir; Hidalgo, Arturo; Weiner, Brad; Morell, Gerardo

doi:10.1063/1.3590153

Title: Ultraviolet photosensitivity of sulfur-doped micro- and nano-crystalline diamond

Journal Article · Mon Jun 06 00:00:00 EDT 2011 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3590153· OSTI ID:1076497

Mendoza, Frank ^[1]; Makarov, Vladimir ^[1]; Hidalgo, Arturo ^[1]; Weiner, Brad ^[2]; Morell, Gerardo ^[1]

Univ. of Puerto Rico, San Juan, PR (United States). Inst. for Functional Nanomaterials and Dept. of Physics
Univ. of Puerto Rico, San Juan, PR (United States). Inst. for Functional Nanomaterials and Dept. of Chemistry

The room-temperature photosensitivity of sulfur-doped micro- (MCD), submicro- (SMCD) and nano- (NCD) crystalline diamond films synthesized by hot-filament chemical vapor deposition was studied. The structure and composition of these diamond materials were characterized by Raman spectroscopy, scanning electron microscopy and X-ray diffraction. The UV sensitivity and response time were studied for the three types of diamond materials using a steady state broad UV excitation source and two pulsed UV laser radiations. It was found that they have high sensitivity in the UV region, as high as 10⁹ sec^-1mV^-1 range, linear response in a broad spectral range below 320 nm, photocurrents around ~10^-5 A, and short response time better than 100 ns, which is independent of fluency intensity. A phenomenological model was applied to help understand the role of defects and dopant concentration on the materials’ photosensitivity.

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Research Organization:: Univ. of Puerto Rico, San Juan, PR (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Biological and Environmental Research (BER)

Grant/Contract Number:: FG02-08ER46526

OSTI ID:: 1076497

Journal Information:: Journal of Applied Physics, Vol. 109, Issue 11; ISSN 0021-8979

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 7 works

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