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Title: Feasibility of synthesizing oxide films on ceramic and metal substrates. Final report, August 1994--May 1995

Abstract

Feasibility of synthesizing highly adherent alumina and chromia films on SiC and FeAl substrates using plasma methods was studied. A magnetically filtered, cathodic-arc-produced, metal plasma (Al or Cr) is deposited on the substrate in presence of low pressure oxygen while the substrate is repetitively pulse biased for control of incident ion energy. In the early stages, the ion energy is held in the keV range to produce atomic mixing at the film-substate interface (ion stitching); in the latter stages, the energy is reduced to about 200 eV (IBAD, or ion beam assisted deposition, range) to control the film structure and morphology. Near-stoichiometric films of alumina and chromia were formed on small SiC and FeAl substrates and characterized by RBS, XRD, adhesion, and temperature cycling. The aluminia films were 0.2 to 1.5 {mu} thick, were amorphous prior to heat treatment, and showed an {alpha}-alumina phase after heat treating at 1000 C for up to 16 h. Film substrate adhesion was typically greater than 70 MPa prior to heating, and the thinner films maintained their adhesion even after repetitive cycling in temperature between ambient and 1000 C. It is concluded that the plasma and ion beam techniques developed provide important tools formore » forming highly adherent and thermally tolerant ceramic films.« less

Authors:
 [1]
  1. Lawrence Berkeley Lab., CA (United States)
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
106736
Report Number(s):
LBL-37487; ORNL/Sub-94-SS109/01
ON: DE95017558
DOE Contract Number:  
AC03-76SF00098; AC05-84OR21400
Resource Type:
Technical Report
Resource Relation:
Other Information: PBD: Jul 1995
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ALUMINIUM OXIDES; DEPOSITION; CHROMIUM OXIDES; THIN FILMS; PROGRESS REPORT; PLASMA; ION BEAMS; ADHESION; SUBSTRATES; THERMAL CYCLING

Citation Formats

Brown, I G. Feasibility of synthesizing oxide films on ceramic and metal substrates. Final report, August 1994--May 1995. United States: N. p., 1995. Web. doi:10.2172/106736.
Brown, I G. Feasibility of synthesizing oxide films on ceramic and metal substrates. Final report, August 1994--May 1995. United States. https://doi.org/10.2172/106736
Brown, I G. 1995. "Feasibility of synthesizing oxide films on ceramic and metal substrates. Final report, August 1994--May 1995". United States. https://doi.org/10.2172/106736. https://www.osti.gov/servlets/purl/106736.
@article{osti_106736,
title = {Feasibility of synthesizing oxide films on ceramic and metal substrates. Final report, August 1994--May 1995},
author = {Brown, I G},
abstractNote = {Feasibility of synthesizing highly adherent alumina and chromia films on SiC and FeAl substrates using plasma methods was studied. A magnetically filtered, cathodic-arc-produced, metal plasma (Al or Cr) is deposited on the substrate in presence of low pressure oxygen while the substrate is repetitively pulse biased for control of incident ion energy. In the early stages, the ion energy is held in the keV range to produce atomic mixing at the film-substate interface (ion stitching); in the latter stages, the energy is reduced to about 200 eV (IBAD, or ion beam assisted deposition, range) to control the film structure and morphology. Near-stoichiometric films of alumina and chromia were formed on small SiC and FeAl substrates and characterized by RBS, XRD, adhesion, and temperature cycling. The aluminia films were 0.2 to 1.5 {mu} thick, were amorphous prior to heat treatment, and showed an {alpha}-alumina phase after heat treating at 1000 C for up to 16 h. Film substrate adhesion was typically greater than 70 MPa prior to heating, and the thinner films maintained their adhesion even after repetitive cycling in temperature between ambient and 1000 C. It is concluded that the plasma and ion beam techniques developed provide important tools for forming highly adherent and thermally tolerant ceramic films.},
doi = {10.2172/106736},
url = {https://www.osti.gov/biblio/106736}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jul 01 00:00:00 EDT 1995},
month = {Sat Jul 01 00:00:00 EDT 1995}
}