13.2 nm Table-Top Inspection Microscope for Extreme Ultraviolet Lithography Mask Defect Characterization
Journal Article
·
· Optics Infobase conference papers series
We report on a reflection microscope that operates at 13.2-nm wavelength with a spatial resolution of 55{+-}3 nm. The microscope uses a table-top EUV laser to acquire images of photolithography masks in 20 seconds.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- Materials Sciences Division
- DOE Contract Number:
- DE-AC02-05CH11231
- OSTI ID:
- 1052169
- Report Number(s):
- LBNL-5230E
- Journal Information:
- Optics Infobase conference papers series, Journal Name: Optics Infobase conference papers series; ISSN 2162-2701
- Country of Publication:
- United States
- Language:
- English
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