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Title: Enhancing the Electron Mobility via Delta-Doping in SrTiO3

Journal Article · · Applied Physics Letters 97, 222115:1-3 (2010)
OSTI ID:1023772

We fabricated high-mobility {delta}-doped structures in SrTiO{sub 3} thin films in order to investigate the low temperature electronic transport properties of confined carriers in this system. An enhancement of the electron mobility above the bulk value was observed as the doped layer thickness decreased. High-field Hall measurements revealed that this mobility enhancement originates from higher-mobility electrons in the undoped clean regions, which have quantum-mechanically broadened from the doped layer. Because of the absence of apparent lattice misfit between the layers, this structure is highly suitable for investigating two-dimensional electron gases in SrTiO{sub 3}

Research Organization:
SLAC National Accelerator Lab., Menlo Park, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC02-76SF00515
OSTI ID:
1023772
Report Number(s):
SLAC-PUB-14512; APPLAB; TRN: US201120%%1091
Journal Information:
Applied Physics Letters 97, 222115:1-3 (2010), Vol. 97, Issue 1-3; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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