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Title: New metallographic preparation techniques for tantalum and tantalum alloys

Conference ·
OSTI ID:102236

Two new metallographic techniques have been developed for tantalum and its alloys. The first is a chemical polishing method that can even be used on specimens immediately after grinding on silicon carbide papers. The second is an etching technique that even delineates low-angle grain boundaries, making it particularly suitable for quantitative grain size measurements. It has also been determined that these are suitable for the preparation of a surprisingly large variety of other metals and alloys, including, titanium, tungsten, Ti-6Al-4V, molybdenum, a Zr-Ti-Cu-Ni alloy, a Ti-Ta-Sc alloy, Fansteel 85, and a Hf-Zr alloy to name a few.

Research Organization:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Sponsoring Organization:
Department of Defense, Washington, DC (United States)
DOE Contract Number:
W-7405-ENG-36
OSTI ID:
102236
Report Number(s):
LA-UR-95-2631; CONF-9507160-1; ON: DE95016985; TRN: AHC29524%%116
Resource Relation:
Conference: 28. international Metallographic Society (IMS) conference, Albuquerque, NM (United States), 25-26 Jul 1995; Other Information: PBD: [1995]
Country of Publication:
United States
Language:
English