Plasma Treatment of Niobium SRF Cavity Surfaces
Plasma based surface modification provides an excellent opportunity to eliminate non- superconductive pollutants in the penetration depth region of the SRF cavity surface and to remove mechanically damaged surface layer improving surface roughness. We have demonstrated on flat samples that plasma etching in Ar / Cl2 of bulk Nb is a viable alternative surface preparation technique to BCP and EP methods, with comparable etching rates. The geometry of SRF cavities made of bulk Nb defines the use of asymmetric RF discharge configuration for plasma etching. In a specially designed single cell cavity with sample holders, discharge parameters are combined with etched surface diagnostics to obtain optimum combination of etching rates, roughness and homogeneity in a variety of discharge types, conditions, and sequences. The optimized experimental conditions will ultimately be applied to single cell SRF cavities.
- Research Organization:
- Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- AC05-06OR23177
- OSTI ID:
- 1018921
- Report Number(s):
- JLAB-ACC-10-1236; DOE/OR/23177-1307; TRN: US201114%%419
- Resource Relation:
- Conference: IPAC'10, Kyoto, Japan, 23-28 May 2010
- Country of Publication:
- United States
- Language:
- English
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