Effects of ambient conditions on the adhesion of cubic boron nitride films on silicon substrates
- California Univ., Davis, CA (United States). Dept. of Mechanical Engineering
- Sandia National Labs., Livermore, CA (United States)
Effect of environmental conditions on cubic boron nitride (cBN) film adhesion to silicon substrates was studied. cBN films were deposited onto (100)-oriented silicon substrates by ion-assisted pulsed laser deposition. Irradiating ions were mixtures of nitrogen with argon, krypton, and xenon. Under room-ambient conditions, the films delaminated in the following time order: N/Xe, N/Kr, and N/Ar. cBN films deposited using N/Xe ion-assisted deposition were exposed to four environmental conditions for several weeks: a 1-mTorr vacuum, high humidity, dry oxygen, and dry nitrogen. Films exposed to the humid environment delaminated whereas those stored under vacuum or in dry gases did not. Films stored in dry nitrogen were removed after nearly two weeks and placed in the high-humidity chamber; these films subsequently delaminated within 14 hours.
- Research Organization:
- Sandia National Labs., Livermore, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 10176101
- Report Number(s):
- SAND-94-8620C; CONF-940440-4; ON: DE94016779
- Resource Relation:
- Conference: International conference on metallurgical coatings and thin films,San Diego, CA (United States),25-29 Apr 1994; Other Information: PBD: [1994]
- Country of Publication:
- United States
- Language:
- English
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