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Title: Femtosecond probe-probe transmission studies of LT-grown GaAs near the band edge

Conference ·
OSTI ID:10124551

We have studied the near-edge optical response of a LT-grown GaAs sample which was deposited at 300{degrees}C on a Si substrate, and then annealed at 600{degrees}C. The Si was etched away to leave a 1 micron free standing GaAs film. Femtosecond transmission measurements were made using an equal pulse technique at four wavelengths between 825 and 870 nm. For each wavelength we observe both a multipicosecond relaxation time, as well as a shorter relaxation time which is less than 100 femtoseconds.

Research Organization:
Lawrence Livermore National Lab., CA (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
10124551
Report Number(s):
UCRL-JC-115625; CONF-940411-1; ON: DE94006660
Resource Relation:
Conference: Spring meeting of the Materials Research Society (MRS),San Francisco, CA (United States),4-8 Apr 1994; Other Information: PBD: Dec 1993
Country of Publication:
United States
Language:
English