Femtosecond probe-probe transmission studies of LT-grown GaAs near the band edge
Conference
·
OSTI ID:10124551
We have studied the near-edge optical response of a LT-grown GaAs sample which was deposited at 300{degrees}C on a Si substrate, and then annealed at 600{degrees}C. The Si was etched away to leave a 1 micron free standing GaAs film. Femtosecond transmission measurements were made using an equal pulse technique at four wavelengths between 825 and 870 nm. For each wavelength we observe both a multipicosecond relaxation time, as well as a shorter relaxation time which is less than 100 femtoseconds.
- Research Organization:
- Lawrence Livermore National Lab., CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 10124551
- Report Number(s):
- UCRL-JC-115625; CONF-940411-1; ON: DE94006660
- Resource Relation:
- Conference: Spring meeting of the Materials Research Society (MRS),San Francisco, CA (United States),4-8 Apr 1994; Other Information: PBD: Dec 1993
- Country of Publication:
- United States
- Language:
- English
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