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Title: Surface crystallization and thin film melting in normal alkanes

Technical Report ·
DOI:https://doi.org/10.2172/10117552· OSTI ID:10117552
 [1];  [2];  [3];  [4]; ; ; ;  [5]
  1. Northern Illinois Univ., DeKalb, IL (United States). Physics Dept.
  2. Ohio State Univ., Columbus, OH (United States). Dept. of Physics
  3. Brookhaven National Lab., Upton, NY (United States). Physics Dept.
  4. Bar Ilan Univ., Ramat Gan (Israel). Physics Dept.
  5. Exxon Research and Engineering Co., Annandale, NJ (United States). Corporate Research Science Labs.

Normal alkanes of carbon number n > 14 exhibit surface crystallization at their liquid-vapor interface. This has been investigated with x-ray reflectivity, grazing incidence scattering and surface tension measurements. The structure and thermodynamics of the surface layer is consistent with a monolayer of the bulk rotator phase occurring at the surface above the bulk melting temperature. On the other hand, thin films of alkanes on SiO{sub 2}, exhibit a reduction of the melting temperature. The surface crystalline phase is observed for carbon number n > 14. The vanishing of surface phase for small n may be due to a transition from surface freezing to surface melting behavior. These measurements can yield the relative surface energies of the various phases. 41 refs.

Research Organization:
Brookhaven National Lab. (BNL), Upton, NY (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
AC02-76CH00016
OSTI ID:
10117552
Report Number(s):
BNL-61312; CONF-941144-57; ON: DE95006694; TRN: AHC29508%%28
Resource Relation:
Conference: Fall meeting of the Materials Research Society (MRS),Boston, MA (United States),28 Nov - 9 Dec 1994; Other Information: PBD: [1994]
Country of Publication:
United States
Language:
English

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