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Title: Ion acceleration and cooling in gasless self-sputtering

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3521264· OSTI ID:1001044

Copper plasma with hyperthermal directed velocity (8.8 eV) but very low temperature (0.6 eV) has been obtained using self-sputtering far above the runaway threshold. Ion energy distribution functions (IEDFs) were simultaneously measured at 34 locations. The IEDFs show the tail of the Thompson distribution near the magnetron target. They transform to shifted Maxwellians with the ions being accelerated and cooled. We deduce the existence of a highly asymmetric, pressure-driven potential hump which acts as a controlling"watershed" between the ion return flux and the expanding plasma.

Research Organization:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
Accelerator& Fusion Research Division
DOE Contract Number:
DE-AC02-05CH11231
OSTI ID:
1001044
Report Number(s):
LBNL-4110E; APPLAB; TRN: US1100265
Journal Information:
Applied Physics Letters, Vol. 97, Issue 22; ISSN 0003-6951
Country of Publication:
United States
Language:
English