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  1. How heteroepitaxy occurs on strontium titanate

    Inmore » traditional models of heteroepitaxy, the substrate serves mainly as a crystalline template for the thin-film lattice, dictating the initial roughness of the film and the degree of coherent strain. Here, performing in situ surface x-ray diffraction during the heteroepitaxial growth of LaTiO3on SrTiO3(001), we find that a TiO2adlayer composed of the ( 13 × 13 ) R33.7° and ( 2 × 2 ) R45.0° reconstructions is a highly active participant in the growth process, continually diffusing to the surface throughout deposition. The effects of the TiO2adlayer on layer-by-layer growth are investigated using different deposition sequences and anomalous x-ray scattering, both of which permit detailed insight into the dynamic layer rearrangements that take place. Our work challenges commonly held assumptions regarding growth on TiO2-terminated SrTiO3(001) and demonstrates the critical role of excess TiO2surface stoichiometry on the initial stages of heteroepitaxial growth on this important perovskite oxide substrate material.« less
  2. Light-induced charge density wave in LaTe3

    When electrons in a solid are excited by light, they can alter the free energy landscape and access phases of matter that are out of reach in thermal equilibrium. This accessibility becomes important in the presence of phase competition, when one state of matter is preferred over another by only a small energy scale that, in principle, is surmountable by the excitation. In this paper, we study a layered compound, LaTe3, where a small lattice anisotropy in the a–c plane results in a unidirectional charge density wave (CDW) along the c axis. Using ultrafast electron diffraction, we find that, aftermore » photoexcitation, the CDW along the c axis is weakened and a different competing CDW along the a axis subsequently emerges. The timescales characterizing the relaxation of this new CDW and the reestablishment of the original CDW are nearly identical, which points towards a strong competition between the two orders. Lastly, the new density wave represents a transient non-equilibrium phase of matter with no equilibrium counterpart, and this study thus provides a framework for discovering similar states of matter that are ‘trapped’ under equilibrium conditions.« less
  3. In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy

    In situ studies of oxide molecular beam epitaxy by synchrotron x-ray scattering has been made possible by upgrading an existing UHV/molecular beam epitaxy (MBE) six-circle diffractometer system. For oxide MBE growth, pure ozone delivery to the chamber has been made available, and several new deposition sources have been made available on a new 12 in. CF (ConFlat, a registered trademark of Varian, Inc.) flange. X-ray diffraction has been used as a major probe for film growth and structures for the system. In the original design, electron diffraction was intended for the secondary diagnostics available without the necessity of the x-raymore » and located at separate positions. Deposition of films was made possible at the two diagnostic positions. And, the aiming of the evaporation sources is fixed to the point between two locations. Ozone can be supplied through two separate nozzles for each location. Also two separate thickness monitors are installed. Additional features of the equipment are also presented together with the data taken during typical oxide film growth to illustrate the depth of information available via in situ x-ray techniques.« less
  4. In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy

    In situ studies of oxide molecular beam epitaxy by synchrotron x-ray scattering has been made possible by upgrading an existing UHV/molecular beam epitaxy (MBE) six-circle diffractometer system. For oxide MBE growth, pure ozone delivery to the chamber has been made available, and several new deposition sources have been made available on a new 12 in. CF (ConFlat, a registered trademark of Varian, Inc.) flange. X-ray diffraction has been used as a major probe for film growth and structures for the system. In the original design, electron diffraction was intended for the secondary diagnostics available without the necessity of the x-raymore » and located at separate positions. Deposition of films was made possible at the two diagnostic positions. And, the aiming of the evaporation sources is fixed to the point between two locations. Ozone can be supplied through two separate nozzles for each location. Also two separate thickness monitors are installed. Finally, additional features of the equipment are also presented together with the data taken during typical oxide film growth to illustrate the depth of information available via in situ x-ray techniques.« less

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