Role of structural defects in mediating disordering processes at irradiated epitaxial Fe 3 O 4 / Cr 2 O 3 interfaces
Disordering processes in oxide materials are complicated by the presence of interfaces, which can serve as either point defect sinks or accumulation sites; the response depends on factors such as interfacial structure, chemistry, and termination. Here, we have characterized the disordering of epitaxial Fe3O4 (111) / Cr2O3 (0001) thin film heterostructures after 400 keV Ar2+ radiation at room temperature. The density of misfit dislocations in both the Fe3O4 overlayer and Cr2O3 buffer layer is varied by changing the thickness of Cr2O3 to be pseudomorphically strained to the Al2O3 (0001) substrate (5 nm thick) or partially relaxed (20 nm thick), asmore »