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Title: Experimental and theoretical investigation of the self-reaction of phenyl radicals.

Journal Article · · J. Phys. Chem. A
DOI:https://doi.org/10.1021/jp1031064· OSTI ID:989075

A combination of experiment and theory is applied to the self-reaction kinetics of phenyl radicals. The dissociation of phenyl iodide is observed with both time-of-flight mass spectrometry, TOF-MS, and laser schlieren, LS, diagnostics coupled to a diaphragmless shock tube for temperatures ranging from 1276 to 1853 K. The LS experiments were performed at pressures of 22 {+-} 2, 54 {+-} 7, and 122 {+-} 6 Torr, and the TOF-MS experiments were performed at pressures in the range 500-700 Torr. These observations are sensitive to both the dissociation of phenyl iodide and to the subsequent self-reaction of the phenyl radicals. The experimental observations indicate that both these reactions are more complicated than previously assumed. The phenyl iodide dissociation yields {approx}6% C{sub 6}H{sub 4} + HI in addition to the major and commonly assumed C{sub 6}H{sub 5} + I channel. The self-reaction of phenyl radicals does not proceed solely by recombination, but also through disproportionation to benzene + o-/m-/p-benzynes, with comparable rate coefficients for both. The various channels in the self-reaction of phenyl radicals are studied with ab initio transition state theory based master equation calculations. These calculations elucidate the complex nature of the C{sub 6}H{sub 5} self-reaction and are consistent with the experimental observations. The theoretical predictions are used as a guide in the development of a model for the phenyl iodide pyrolysis that accurately reproduces the observed laser schlieren profiles over the full range of the observations.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
DOE Contract Number:
DE-AC02-06CH11357
OSTI ID:
989075
Report Number(s):
ANL/CSE/JA-66654; TRN: US201019%%269
Journal Information:
J. Phys. Chem. A, Vol. 114, Issue 32 ; Aug. 19, 2010
Country of Publication:
United States
Language:
ENGLISH