Buckling in nanomechanical films
- ORNL
- Michigan State University, East Lansing
Wrinkling is a common everyday occurrence. Over the last decade wrinkling in thin films has become an interesting topic. Nearly all studies to date have focused on the underlying physics or how the wrinkles can be used for a final purpose. With more and more devices being created from stacked materials, a need for ways to prevent buckling has arisen. In this article we highlight the prevention of wrinkling of nanoscale thin films.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- DE-AC05-00OR22725
- OSTI ID:
- 985759
- Journal Information:
- Soft Matter, Vol. 6, Issue 16; ISSN 1744-683X
- Country of Publication:
- United States
- Language:
- English
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