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Title: Effect of annealing on local composition and electrical transport correlations in MgO-based magnetic tunnel junctions.

Journal Article · · Appl. Phys. Lett.
DOI:https://doi.org/10.1063/1.2970964· OSTI ID:961715

The effects of annealing on the electrical transport behavior of CoFe/MgO/CoFe magnetic tunnel junctions have been studied using a combination of site-specific in situ transmission electron microscopy and three-dimensional atom-probe tomography. Annealing leads to an increase in the resistance of the junctions. A shift in the conductance curve (dI/dV) minimum from 0 V for the as-grown specimen correlates with a sharply defined layer of CoFe oxide at the lower ferromagnetic interface. Annealing decreases the asymmetry in the conductance by making the interfaces more diffuse and the tunnel barrier more chemically homogeneous.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Organization:
National Science Foundation (NSF); ORN
DOE Contract Number:
DE-AC02-06CH11357
OSTI ID:
961715
Report Number(s):
ANL/MSD/JA-61737; APPLAB; TRN: US200923%%171
Journal Information:
Appl. Phys. Lett., Vol. 93, Issue 2009; ISSN 0003-6951
Country of Publication:
United States
Language:
ENGLISH