Fabrication of metallic nano-slit waveguides with sharp bends.
Metallic nanoslit waveguides are promising candidates for ultrahigh-density optical interconnections. A variety of devices based on metallic nanoslit waveguides have already been proposed that show a great superiority over conventional photonic devices for compactness. However very few two-dimensional devices have been experimentally demonstrated with in-plane geometries due to fabrication difficulties. In this article, a feasible process is presented using traditional semiconductor fabrication technologies such as mix-and-match lithography and electroplating, which is capable of fabricating complicated 100 nm wide, 800 nm deep gold slit waveguides with multiple sharp right-angle corners. The process can be extended to volume production manufacturing with minor modifications, thus enabling the fabrication of nanoslit photonic circuits and networks.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- DE-AC02-06CH11357
- OSTI ID:
- 947083
- Report Number(s):
- ANL/CNM/CP-61992; TRN: US200903%%933
- Journal Information:
- J. Vac. Sci. Technol. B, Vol. 26, Issue 6 ; 2008; Conference: 52nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication; May 27, 2008 - May 30, 2008; Portland, OR
- Country of Publication:
- United States
- Language:
- ENGLISH
Similar Records
Experimental demonstration of an on-chip polarization splitter in a submicron asymmetric dielectric-coated metal slit
Deep-etch silicon millimeter waveguide structure for electron acceleration